China has potentially marked a major milestone in its semiconductor sector with reports indicating the creation of the first domestic EUV prototype. This development could prove to be pivotal in the nation’s pursuit of technological self-reliance amidst growing global demand for advanced chips.
China’s Bold Moves Towards EUV Lithography
Over several years, Beijing has strived toward achieving a breakthrough in EUV technology. Companies such as SMIC have been actively trying to replicate ASML’s technology through reverse-engineering and attracting top talent. Reports suggest that these efforts have led to the creation of an operational EUV lithography prototype. Although this progress is promising, it relies heavily on older ASML parts, yet it illustrates rapid advancements that have surprised many observers.
In April, ASML CEO Christophe Fouquet said that China would need “many, many years” to develop such technology. But the existence of this prototype, reported by Reuters for the first time, suggests China may be years closer to achieving semiconductor independence than analysts anticipated.
– Reuters
Despite the complexities involved in EUV lithography machines, details about the specific techniques utilized by Chinese engineers remain unclear. The prototype has yet to produce any chips, but sources claim that China aims to make EUV technology mainstream by 2030. This timeline is significantly earlier than previously estimated, suggesting a faster catch-up with the US in the semiconductor race.
Rising Demand for Self-Built Semiconductors
The surge in AI technology has heightened China’s demand for self-manufactured semiconductors. Companies like Huawei are intensifying efforts to secure chip capacity by partnering with SMIC to establish a network of production facilities. SMIC’s N+3 process, developed under current technological constraints, is reportedly on par with mainstream 5nm processes. While there is still much to learn about the operation of China’s EUV machine, particularly the light source and other technical parameters, this development signifies a noteworthy stride in the semiconductor industry.